MOAFAB

2차이온질량분석기

Secondary Ion Mass Spectrometry (SIMS)

3차원 프로파일러

3D Profiler

3D Atom Probe Tomography (LEAP4000X HR) 1

3D Atom Probe Tomography (LEAP4000X HR) 1

3D Conforcal Scanning Microscope (3DCSM)

3D Conforcal Scanning Microscope (3DCSM)

4단 면저항 측정기-1

4 Point Probe - 1

8인치 트렉 시스템-2 (SVS)

PR Track_SVS - 2

8인치 트렉 시스템-3 (SVS)

PR Track_SVS - 3

감광제 제거 시스템-Ⅱ

PR Asher_FEOL - 2

감광제 제거 시스템-I

PR Asher_FEOL - 1

고온 습식/건식 산화로

Furnace Oxidation_LEAD

고온이온주입장치

SiC ion implantation

광학현미경-Diffusion

Optical Microscopes-Diffusion

광학현미경-EBL

Optical Microscopes-EBL

광학현미경-Etch

Optical Microscopes - Etch

광학현미경-I

Optical Microscopes - Photo

광학현미경-THinFilm

Optical Microscopes - ThinFilm

구면수차보정 투과전자현미경

HR FE-TEM-Ⅱ (2200FS with Image Cs Corrector)

구면수차보정 투과전자현미경

HR FE-TEM-Ⅰ (2100F with Probe Cs-Corrector)

급속열산화막용 급속열처리기

RTP for RTO

노광기-2

I-Line Stepper - 2

노광기-4

I-Line Stepper - 4

마스크리스 레이저 리소그래피 시스템

Maskless laser lithography system

마스크얼라이너

Mask Aligner_MA6

물리증착장치(스퍼터)- II

Sputter_ENDURA - 2

박막두께측정기

Spectroscopic Ellipsometer

선폭&표면 측정장치

CD&Surface inspection system

세정 및 에칭장치

Wet Station_Acid - 1

스트레스측정시스템

Stress Measurement System

스핀건조기

Spin Rinse Dryer

알파스텝(ME)

Alpha-Step (ME)

원자층증착장치

Atomic Layer Deposition (ALD)

임계치수 측정 주사현미경

CD-SEM

자외선 트렉 시스템

PR Track_DAVID

저압 화학증착장치

LP-CVD

전계 방출형 주사전자현미경

[Hitachi S-4800] High Resolution FE-SEM- Ⅲ

전계 방출형 주사전자현미경

[JSM 7800F PRIME with Dual EDS] High Resolution FE-SEM-Ⅱ

전계 방출형 주사전자현미경

[JSM 7401F] High Resolution FE-SEM-I

전계방출전자현미경

HR FE-SEM (in Clean Room)

전자빔 증착장비

E-beam Evaporator-2

전자빔리소그래피시스템-1

E-Beam Lithography System - 1

전자빔리소그래픽시스템-2

E-Beam Lithography System - 2

전자빔증착기-1

E-Beam Evaporator - 1

절연막건식 식각 장비

Dry Etcher - TEL

커브트레이서 및 프로브 스테이션

Curve Tracer & Probe Station

프로브스테이션_파워반도체(소자)

Probe Station_Power Semiconductor

플라즈마 유도결합 식각장치

Dry Etcher_DMS

플라즈마증착장치 - P5000

PE-CVD - P5000

플라즈마증착장치-1

PE-CVD-1

플라즈마증착장치-2

PE-CVD-2

AP-CVD

AP-CVD

APLT SPEED-200iD

APLT SPEED-200iD

Atomic Force Microscope-Ⅰ(D 3100) / AFM-Ⅰ

Atomic Force Microscope-Ⅰ(D 3100) / AFM-Ⅰ

Atomic Force Microscope-Ⅱ(Jupiter XR) / AFM - Ⅱ

Atomic Force Microscope-Ⅱ(Jupiter XR) / AFM - Ⅱ

Cutting/Grinding/Polishing System

Cutting/Grinding/Polishing System

DC&RF 물리증착장비

DC&RF Sputtering system

Deep Reactive Ion Etcher(DRIE) - 1

Deep Reactive Ion Etcher(DRIE) - 1

Deep Reactive Ion Etcher(DRIE) - 2

Deep Reactive Ion Etcher(DRIE) - 2

Dry Etcher_Oxide

Dry Etcher_Oxide

Dry Etcher_Poly Si

Dry Etcher_Poly Si

Dry-Etcher_gigalane

Dry-Etcher_gigalane

Focused Ion Beam -Ⅰ(Helios 600 with TKD) / FIB -Ⅰ

Focused Ion Beam -Ⅰ(Helios 600 with TKD) / FIB -Ⅰ

Focused Ion Beam -Ⅱ(Helios 650 with EBSD) / FIB -Ⅱ

Focused Ion Beam -Ⅱ(Helios 650 with EBSD) / FIB -Ⅱ

Focused Ion Beam -Ⅲ(Helios G3 CX) / FIB -Ⅲ

Focused Ion Beam -Ⅲ(Helios G3 CX) / FIB -Ⅲ

Focused Ion Beam -Ⅳ(SMI 3050) / FIB - Ⅳ

Focused Ion Beam -Ⅳ(SMI 3050) / FIB - Ⅳ

Furnace Activator_SiC 200

Furnace Activator_SiC 200

Furnace High Temp anneal_SiC

Furnace High Temp anneal_SiC

Furnace Metal Anneal

Furnace Metal Anneal

High Resolution FE-SEM-Ⅳ (JSM-IT710HR)

High Resolution FE-SEM-Ⅳ (JSM-IT710HR)

High Resolution Powder-XRD

High Resolution Powder-XRD

ICP 식각 장치 - 2

Dry-Etcher_Ulvac

ICP 식각장치

Dry Etcher_ICP

I-Line Stepper - 1

I-Line Stepper - 1

I-Line Stepper-3

I-Line Stepper-3

Ion Beam Thinner

Ion Beam Thinner

LPCVD Furnace

LPCVD Furnace

Mask Aligner_MA8

Mask Aligner_MA8

Mask Aligner_ME

Mask Aligner_ME

MEMS Spin Coater

MEMS Spin Coater

MEMS Yellow Wet station

MEMS Yellow Wet station

MEMS Yellow Wet station - Organic

MEMS Yellow Wet station - Organic

Metal Lift-Off

Metal Lift-Off

NEMS 제작을 위한 Base System

NEMS Base System (optical microscope)

NEMS White Wet station - Acid

NEMS White Wet station - Acid

NEMS White Wet station - Organic

NEMS White Wet station - Organic

Nikon KrF S204B

Nikon KrF S204B

PECVD System P-5000

PECVD System P-5000

PR Asher for BEOL

PR Asher for BEOL

PR Spin Coater_Sawatec

PR Spin Coater_Sawatec

PR Track_SVS - 1

PR Track_SVS - 1

PR Track_TEL - 1

PR Track_TEL - 1

PZT sputtering

PZT sputtering

Raman Spectroscopy(Alpha 300 R)

Raman Spectroscopy(Alpha 300 R)

RTP for Silicide

RTP for Silicide

Sputter_ENDURA - 1

Sputter_ENDURA - 1

TEL Spinner ACT8

TEL Spinner ACT8

UHV-CVD

UHV-CVD

UV/Vis/nIR Spectrometer

UV/Vis/nIR Spectrometer

Wafer Laser Marker

Wafer Laser Marker

Wet Station_Acid - 2

Wet Station_Acid - 2

Wet Station_Acid - Metal

Wet Station_Acid - Metal